DM11201001化學氣相沉積 – 友購快

顯示第 1 至 12 項結果，共 52 項

化學氣相沉積(CVD)材料 (Precursor for CVD.ALD Deposition)

Molybdenum(VI) oxide 99.97% trace metals basis

Molybdenum(VI) oxide 99.97% trace metals basis

AL-203815-25G
CAS: 1313-27-5

Molybdenum(VI) oxide 99.97% trace metals basis

Molybdenum(VI) oxide 99.97% trace metals basis

AL-203815-5G
CAS: 1313-27-5

Tungsten hexacarbonyl 97%

Tungsten hexacarbonyl 97%

AL-241431-10G
CAS: 14040-11-0

Tungsten hexacarbonyl 97%

Tungsten hexacarbonyl 97%

AL-241431-50G
CAS: 14040-11-0

Silicon tetrachloride 99.998% trace metals basis

Silicon tetrachloride 99.998% trace metals basis

AL-289388-100ML
CAS: 10026-04-7

Silicon tetrachloride 99.998% trace metals basis

Silicon tetrachloride 99.998% trace metals basis

AL-289388-800ML
CAS: 10026-04-7

Tetraethyl orthosilicate 99.999% trace metals basis

Tetraethyl orthosilicate 99.999% trace metals basis

AL-333859-100ML
CAS: 78-10-4

Tetraethyl orthosilicate 99.999% trace metals basis

Tetraethyl orthosilicate 99.999% trace metals basis

AL-333859-25ML
CAS: 78-10-4

Tantalum(V) ethoxide 99.98% trace metals basis

Tantalum(V) ethoxide 99.98% trace metals basis

AL-339113-100G
CAS: 6074-84-6

Tantalum(V) ethoxide 99.98% trace metals basis

Tantalum(V) ethoxide 99.98% trace metals basis

AL-339113-10G
CAS: 6074-84-6

Titanium(IV) isopropoxide 99.999% trace metals basis

Titanium(IV) isopropoxide 99.999% trace metals basis

AL-377996-100ML
CAS: 546-68-9

Titanium(IV) isopropoxide 99.999% trace metals basis

Titanium(IV) isopropoxide 99.999% trace metals basis

AL-377996-25ML
CAS: 546-68-9