DM11203001光阻液 – 友購快

Showing all 11 results

光阻液 Photoresist

Acetone, Semiconductor Grade, 99.5%

Acetone, Semiconductor Grade, 99.5%

AF-19392-1L
CAS: 67-64-1

Acetone, Semiconductor Grade, 99.5%

Acetone, Semiconductor Grade, 99.5%

AF-19392-4L
CAS: 67-64-1

2-Propanol, Semiconductor Grade, 99.5% min

2-Propanol, Semiconductor Grade, 99.5% min

AF-19397-1L
CAS: 67-63-0

2-Propanol, Semiconductor Grade, 99.5% min

2-Propanol, Semiconductor Grade, 99.5% min

AF-19397-4L
CAS: 67-63-0

2-Propanol, Semiconductor Grade, 99.5% min

2-Propanol, Semiconductor Grade, 99.5% min

AF-19397-500ML
CAS: 67-63-0

Tetramethylammonium hydroxide, 25% w/w Aqueous Solution, Electronic Grade, 99.9999% (metals basis)

Tetramethylammonium hydroxide, 25% w/w Aqueous Solution, Electronic Grade, 99.9999% (metals basis)

AF-20932-1L
CAS: 75-59-2

Tetramethylammonium hydroxide, 25% w/w Aqueous Solution, Electronic Grade, 99.9999% (metals basis)

Tetramethylammonium hydroxide, 25% w/w Aqueous Solution, Electronic Grade, 99.9999% (metals basis)

AF-20932-250ML
CAS: 75-59-2

Hexamethyldisilazane, Electronic grade, 99+%

Hexamethyldisilazane, Electronic grade, 99+%

AF-42039-100G
CAS: 999-97-3

Hexamethyldisilazane, Electronic grade, 99+%

Hexamethyldisilazane, Electronic grade, 99+%

AF-42039-25G
CAS: 999-97-3

Hexamethyldisilazane, Electronic grade, 99+%

Hexamethyldisilazane, Electronic grade, 99+%

AF-42039-500G
CAS: 999-97-3

預留位置

S-GAL/LB AGAR/KANAMYCIN BLEND POWDER

SI-S1813-500ML

光阻液 Photoresist：微細圖形轉移的核心關鍵

提供半導體、光電及微機電 (MEMS) 製程所需的高品質光阻方案。具備卓越的附著力、高解析度及良好的耐蝕刻性。

正向光阻 (Positive) 負向光阻 (Negative)

⚡ 優異解析度：滿足微米 (μm) 至次微米級圖形定義需求。
⚡ 穩定塗佈性：優化的黏度分布，確保晶圓表面膜厚均勻性。
⚡ 廣泛應用：適用於 Lift-off 製程、電鍍及各類基材蝕刻。